JPH0714362Y2 - 薄膜形成装置 - Google Patents
薄膜形成装置Info
- Publication number
- JPH0714362Y2 JPH0714362Y2 JP1985115677U JP11567785U JPH0714362Y2 JP H0714362 Y2 JPH0714362 Y2 JP H0714362Y2 JP 1985115677 U JP1985115677 U JP 1985115677U JP 11567785 U JP11567785 U JP 11567785U JP H0714362 Y2 JPH0714362 Y2 JP H0714362Y2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- dispersion plate
- substrate
- film forming
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 title claims description 11
- 239000006185 dispersion Substances 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 18
- 239000007789 gas Substances 0.000 claims description 16
- 239000000498 cooling water Substances 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985115677U JPH0714362Y2 (ja) | 1985-07-27 | 1985-07-27 | 薄膜形成装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985115677U JPH0714362Y2 (ja) | 1985-07-27 | 1985-07-27 | 薄膜形成装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6223856U JPS6223856U (en]) | 1987-02-13 |
JPH0714362Y2 true JPH0714362Y2 (ja) | 1995-04-05 |
Family
ID=30999554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985115677U Expired - Lifetime JPH0714362Y2 (ja) | 1985-07-27 | 1985-07-27 | 薄膜形成装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0714362Y2 (en]) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6014757Y2 (ja) * | 1979-01-09 | 1985-05-10 | 日本電気株式会社 | 蒸着装置 |
JPS5934231B2 (ja) * | 1980-12-19 | 1984-08-21 | 旭硝子株式会社 | Cvd装置の吐出装置 |
JPS6057507B2 (ja) * | 1981-10-20 | 1985-12-16 | 日本重化学工業株式会社 | 超硬高純度窒化珪素の製造装置とその製造方法 |
-
1985
- 1985-07-27 JP JP1985115677U patent/JPH0714362Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS6223856U (en]) | 1987-02-13 |
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